Handbook of Thin Film Process Technology 98/1 Reactive Sputtering
Auteur : Glocker David A
Date de parution : 11-2017
21x29.7 cm
Thèmes de Handbook of Thin Film Process Technology :
Mots-clés :
Pulse DC Power; reactive; Reactive Sputtering; sputtering; Reactive Gas Flow; Glocker David A; Magnetron Sputtering; S Ismat Shah; Thin Film Process Technology; William D Westwood; Reactive Gas Partial Pressure; Jochen M Schneider; Reactive Sputtering Process; William D Sproul; High Substrate Bias; Grant O Este; Reactive Gas; S Berg; RF Discharge; T Nyberg; Thin Compound Layer; H-O Blom; Sputter Source; C Nender; Flat Panel Displays; Secondary Electron Emission Coefficient; Reactive Magnetron Sputtering; RF Reactive Sputtering; Pulse DC; RF Sputtering; Matching Network; Metal Deposition Rate; Reactive Gas Molecules; AC Power Supply; RF Supply; Balun Transformer; Compound Layer