Engineering Thin Films and Nanostructures with Ion Beams
Coordonnateur : Knystautas Emile
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications.
Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that:
From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Date de parution : 09-2019
15.2x22.9 cm
Date de parution : 04-2005
Ouvrage de 400 p.
15.2x22.9 cm
Thèmes d’Engineering Thin Films and Nanostructures with Ion Beams :
Mots-clés :
Ion Implantation; Ion Beam; Ion Irradiation; Ion Beam Mixing; Single Ion Impacts; GCIB; Ion Bombardment; Beam Current; Thin Film; Energetic Particle Bombardment; Surface Morphological Evolution; Ion Implantation Equipment; Glad; Latent Fingerprints; PIXE; Frenkel Defect; Low Energy Ion Irradiation; NC Formation; Surface Damage Mechanisms; MD Simulation; Ion Impacts; Layer Growth; Adatom Mobility; Surface Analysis Techniques; Transition Metal Nitride