Electron Microscopy and Analysis (3rd Ed.)
Auteurs : Goodhew Peter J., Humphreys John, Beanland Richard
Date de parution : 07-2017
15.6x23.4 cm
Date de parution : 11-2000
Ouvrage de 252 p.
15.6x23.4 cm
Thèmes d’Electron Microscopy and Analysis :
Mots-clés :
CBED Pattern; Higher Order Laue Zones; beam; Spherical Aberration; thin; TEM Specimen; specimen; Condenser Lens; diffraction; Beam Current; pattern; Kikuchi Lines; spherical; Reciprocal Lattice; aberration; Everhart Thornley Detector; inelastic; Ewald Sphere; scattering; Crystal Spectrometer; field; Ewald Sphere Construction; Superconductor Barium Yttrium Copper Oxide; Eel Spectrum; Reciprocal Lattice Point; Backscattered Electrons; EDS System; Extinction Contours; Diffraction Pattern; Stacking Fault; Undeflected Beam; Objective Aperture; Secondary Electrons; Diffracted Beam; Dark Field Image