Advances in Imaging and Electron Physics Advances in Imaging and Electron Physics Series
Directeurs de Collection : Hawkes Peter W., Hÿtch Martin
Advances in Imaging and Electron Physics, Volume 209, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
1. Introduction to EELS Alberto Eljarrat Ascunce 2. Low-loss EELS methods Alberto Eljarrat Ascunce 3. DFT modeling of wurtzite III-nitride ternary alloys Alberto Eljarrat Ascunce 4. AlN/GaN and InAlN/GaN DBRs Alberto Eljarrat Ascunce 5. Multiple InGaN QW heterostructure Alberto Eljarrat Ascunce 6. Er-doped Si-nc/SiO2 multilayer Alberto Eljarrat Ascunce 7. Si-NCs embedded in dielectric matrices Alberto Eljarrat Ascunce 8. EELS Conclusions Alberto Eljarrat Ascunce 9. High-Tc Superconductors and Magnetic Electron Lenses Jan-Peter Adriaanse
Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP), is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM), joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.
- Contains contributions from leading authorities on the subject matter
- Informs and updates on the latest developments in the field of imaging and electron physics
- Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electrons and ion emission with a valuable resource
- Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing
Date de parution : 02-2019
Ouvrage de 362 p.
15.2x22.8 cm