The Foundations of Vacuum Coating Technology (2nd Ed.)
Auteur : Mattox Donald M.
The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries.
1. About This Book2. Vacuum Technology3. Plasmas and Plasma Enhanced CVD (PECVD)4. Physical Sputtering and Sputter Deposition5. Thermal Evaporation and Deposition in Vacuum6. Cathodic Arc Vaporization and Cathodic Arc Vapor Deposition7. Ion Plating8. Condensation, Nucleation, Interface Formation, and Film Growth
Appendix1. Historical Timelines2. Glossary of Terms and acronyms
Material scientists and engineers, Academic – engineering students; teachers; Industry – engineers, technicians, management; Patent lawyers
- History and detailed descriptions of Vacuum Deposition Technologies
- Review of Enabling Technologies and their importance to current applications
- Extensively referenced text
- Patents are referenced as part of the history
- Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology
- Glossary of Terms for vacuum coating
Date de parution : 08-2018
Ouvrage de 378 p.
15x22.8 cm
Thème de The Foundations of Vacuum Coating Technology :
Mots-clés :
Adhesion; Antireflecting coatings; Arc vapor deposition; Arc vaporization; Cathodic arc; Chemical sputtering; Crucible; Electron beam; Evaporation; Exploding wire vaporization; Filament; Film growth; Film morphology; History; History of sputtering; Hybrid PVD/PECVD deposition; Interface formation; Intrinsic stress; Ion Beam-Assisted Deposition (IBAD); Ion bombardment; Ion plating; Ion scrubbing; Ion-assisted deposition (IAD); Magnetron; Nucleation; PECVD; Physical sputtering; Plasma assisted PVD; Plasma chemistry; Plasmas; Plasma-surface interaction; Reactive arc vapor deposition; Reactive sputter deposition; Source of references; Sputter cleaning; Sputter deposition; Sublimation; Terminology; Vacuum components; Vacuum systems for vacuum coating; Vacuum technology