Nanoimprint Lithography: An Enabling Process for Nanofabrication, 2013

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application.
This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology.
Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

Principles and statues of nanoimprint lithography.- Stamp Fabrication.- stamp surface treatment.- Nanoimprint lithography resists.- Nanoimprint lithography process.- Modeling and Simulation of NIL.- Application of NIL in Light emitting Diodes.- Application of NIL in memory devices.- Application of NIL in solar cell.

Weimin Zhou Received a Ph.D. degree in Microelectronics and Solid-State Electronics from Shanghai Jiao Tong University, China. He is currently a Professor of Nanomaterials and Nanoelectronics in Shanghai Nanotechnology Promotion Center. His research interests cover semiconductor nanomaterials (nanowires, carbon-based, phase change material), novel semiconductor or nano devices, and nanofabrication, and lithium ion battery, etc. He has authored or coauthored more than 30 papers in scientific journals and is the holder of four patents in the micro/nano electronics area and material Engineering. Some research achievement is highlighted by Nature Nanotechnlogy magazine. He is also a reviewer for many scientific magazines, such as Appl. Phys. Lett, Nanotechnolgoy.

Education:
1996.9-2000.7 Anhui polytechnic University, major in mechanical engineering
2001.9-2003.7 Harbin institute of technology, material engineering.
2004.3-2007.3 Shanghai Jiao Tong University, major in Microelectronics and Solid-State Electronics
2007.4-2009.4 Postdoctral Fellow at Shanghai Institute of Microsystem and Information Technology        

Work experience :
2004.3-2007.3 one –dimensional nanostructure and its application in nanodevices, Fabrication of semiconductor nanowrie/ nanotube, carbon nanotube
2007.4-2009.4 Nanoimprint lithography process and its application in light emitting diodes.  
2009.4- now Associate Professor at Shanghai Nanotechnology Promotion Center Nanoimprint lithography and its application in nanodevices( biosensor, solar cell .et al )

Provides consistent multi-disciplinary approach demonstrating principles of the field including latest achievements in hot areas such as nanofabrication and nanotechnology Includes approximately 200 figures and tables to explain the topic Presents current status and future trends of nanoimprint lithography research