Advances in Superconductivity IV, Softcover reprint of the original 1st ed. 1992 Proceedings of the 4th International Symposium on Superconductivity (ISS ’91), October 14–17, 1991, Tokyo

Five years have passed since the breakthrough in the critical temperature for superconductors. During this period, many superconducting materials have been discovered and developed, and our knowledge of the physical and other properties of oxide superconductors has deepened through extensive and intensive research. This knowledge has advanced superconductivity science and technology from the initial questioning stage to a more developed but still uncertain second stage where research activity in superconductivity now overlaps with fields of application. Generally speaking, science resonates with technology. Science not only complements but also competes with or stimulates technology. New scientific knowledge has triggered the second technological research stage. Much progress has been made in the development of practical devices, encouraging the application of superconductors in areas such as human levitation, a high speed levitated bearing, large current transforming leads, and high frequency devices. This technological progress has increased our understanding of the science involved, such as flux pinning and dynamics, and anomalous long-range superconducting interactions. At this important stage, international cooperation and collaborative projects can effectively sustain aggressive research and development in order to advance superconductivity to the next stages. The ISS Symposium is expected to serve as a venue for increasing our knowledge of superconductivity and for exchanging visions for future research and applications, through the presentation and discus­ of the latest research results. These proceedings also aim to summarize sion annual progress in high-Tc superconductivity in all fields.

1 Plenary Lectures.- 2 Physics.- 3 Chemistry.- 4 Flux Pinning.- 5 Wires, Tapes and Bulk.- 6 Preparation and Properties of Thin Films.- 7 Device Application.- 8 System Application.- Author Index.- Key Word Index.